| Authors: | W. Bogaerts | | Title: | Design Challenges in Silicon Photonics | | Format: | International Conference Proceedings | | Publication date: | 5/2013 | | Journal/Conference/Book: | International Symposium on Photonics and Optoelectronics (SOPO2013)
(invited)
| | Location: | Beijing, China | | Citations: | Look up on Google Scholar
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Abstract
Silicon Photonics is rapidly growing into an industrially viable technology. Based on CMOS manufacturing technology, silicon photonics can be applied for complex, large-volume photonic applications. Also, the high refractive index contrast between silicon and its oxide makes it possible to use sub-micron waveguides. The combination of the high-quality manufacturing tools and the submicron waveguides enables large-scale photonic integration: building more complex optical circuits than possible with any other technology. This introduces several issues on the design level. While the technology is rapidly maturing, the design tools are still falling short. The combination of high index contrast and large-scale, complex circuits introduces design challenges that were hitherto not encountered in integrated photonics. Related Research Topics
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