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Authors: N. Poonkottil, H. Rijckaert, K. Rajendran, R. R. Petit, L. I. D. J. Martin, D. Van Thourhout, I. Van Driessche, C. Detavernier, J. Dendooven
Title: Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layers
Format: International Journal
Publication date: 2/2023
Journal/Conference/Book: Advanced Material Interfaces
Volume(Issue): 10(5) p.paper 2201934 (10 pages)
Citations: Look up on Google Scholar
Download: Download this Publication (2.2MB) (2.2MB)

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