Abstract

Recent advances in oxide thin film deposition techniques are very promising for extending the operating wavelength of silicon photonics into the UV range. The use of this wavelength range for applications is still limited due to the difficulty to handle UV optical signals. UV photonic integrated circuits will solve this problem and they will open new avenues for biological, healthcare and optical quantum computing applications. This talk will review recent results achieved with atomic layer deposition of alumina on thermal oxide wafers for UV optical microscopy applications. We will discuss the main advantages of UV photonic integrated circuits for the implemention of structured illumination microscopy and quantitative phase imaging.