Authors:	W. Bogaerts, P. Dumon, V. Wiaux, J. Wouters, S. Beckx, R. Baets
Title:	Tolerance control for photonic crystal structures fabricated with deep UV lithography
Format:	International Conference Proceedings
Publication date:	9/2003
Journal/Conference/Book:	ECOC 2003
Volume(Issue):	5 p.46-47
Location:	Rimini, Italy
Citations:	Look up on Google Scholar
Download:	(166KB)

Abstract

We describe the need for good tolerance control in planar photonic crystals. Although resolutions of 200nm are possible, an accuracy of 10nm is difficult. We discuss techniques to improve this accuracy for deep UV lithography.

Related Research Topics

• Silicon (nano)photonic devices fabrication with 193nm and 248nm (DUV) Optical lithography (1999-2012)
• Low-loss Nanophotonic waveguides (1999-2010)

Related Projects

• IST: PICCO (Photonic Integrated Circuits using photonic Crystal Optics)
• IAP-V: PHOTON (Photons and Photonics : from basic physics to system concepts)