Authors:	W. Bogaerts, P. Dumon, D. Taillaert, V. Wiaux, S. Beckx, B. Luyssaert, J. Van Campenhout, D. Van Thourhout, R. Baets
Title:	SOI Nanophotonic Waveguide Structures Fabricated with Deep UV Lithography
Format:	International Journal
Publication date:	9/2004
Journal/Conference/Book:	Photonics and Nanostructures: Fundamentals and Applications (invited)
Editor/Publisher:	Elsevier,
Volume(Issue):	2(2) p.81-86
DOI:	10.1016/j.photonics.2004.07.002
Citations:	21 (Dimensions.ai - last update: 15/12/2024) 10 (OpenCitations - last update: 3/5/2024) Look up on Google Scholar
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Abstract

To reduce the dimensions of photonic integrated circuits, high-contrast wavelength-scale structures are needed. We developed a fabrication process for Silicon-on-insulator nanophotonics, based on standard CMOS processing techniques with deep UV lithography. Measurements using either end-fire incoupling or grating-based fibre couplers show photonic crystal waveguides with moderate propagation losses (7.5 dB/mm) and photonic wires with very low propagation losses (0.24 dB/mm).

Related Research Topics

• Silicon (nano)photonic devices fabrication with 193nm and 248nm (DUV) Optical lithography (1999-2012)
• Grating-based based vertical fibre coupler (1999-2012)
• Low-loss Nanophotonic waveguides (1999-2010)
• Microring resonators (2000-2004)

Related Projects

• IST: PICCO (Photonic Integrated Circuits using photonic Crystal Optics)
• IAP-V: PHOTON (Photons and Photonics : from basic physics to system concepts)