Authors:	S. Selvaraja, R. Baets, D. Van Thourhout
Title:	Nanophotonic integrated chip fabricated by CMOS technology
Format:	National Conference Poster
Publication date:	12/2007
Journal/Conference/Book:	8th FirW PhD Symposium
Location:	Gent, Belgium
Citations:	Look up on Google Scholar
Download:	(13KB)

Abstract

we report fabrication of photonic integrated circuit by CMOS process. Low loss deposited silicon-on-insulator was patterned using DUV optical lithography to form photonic circuit. Ring resonators were fabricated to qualify the fabrication process. Propagation loss of the deposited silicon was measured to be 3.5dB/cm at 1550nm. Ring resonators with Q values as high as 20,000 was demonstrated.

Related Research Topics

• Silicon (nano)photonic devices fabrication with 193nm and 248nm (DUV) Optical lithography (1999-2012)
• Deposited SOI technology for photonic application (2006-2012)

Related Projects

• IST: ePIXnet (European Network of Excellence on Photonic Integrated Components and Circuits)